Document Type
Article
Publication Date
12-1993
Publication Title
Chemical Engineering Science
Abstract
Adsorption equilibrium of benzene-p-xylene vapor mixture on silicalite is measured at 70^oC with a specially designed cyclic volumetric apparatus at pressure levels of 2.53 and 1.20 kPa. The isobaric isotherms are S-shaped, and selectivity curves at different pressures cross over; the p-xylene selectivity at 2.53 kPa is higher than that at 1.20 kPa over a certain composition range. The heterogeneous ideal adsorption solution (HIAS) model implemented on two patches qualitatively predicts these highly unusual behavior. The observed extraodinary phenomena are attributed to structural heterogeneity, a result of the tight-fit of sorbate molecules in silicalite pores. The succes of HIAS attests to the paramount importance of adequate representation of heterogeneity in adsorption models.
Repository Citation
Li, Jianmin and Talu, Orhan, "Adsorption Equilibrium of Benzene-P-Xylene Vapor Mixture on Silicalite" (1993). Chemical & Biomedical Engineering Faculty Publications. 69.
https://engagedscholarship.csuohio.edu/encbe_facpub/69
Original Citation
Li, J., , & Orhan, T. (1994). Adsorption equilibrium of benzene-p-xylene vapor mixture on silicalite. Chemical Engineering Science, 49(2), 189-197. doi:10.1016/0009-2509(94)80037-5
Volume
49
Issue
2
DOI
10.1016/0009-2509(94)80037-5
Version
Postprint
Publisher's Statement
NOTICE: this is the author’s version of a work that was accepted for publication in Chemical Engineering Science. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in Chemical Engineering Science, 49, 2, (January 1994) DOI 10.1016/0009-2509(94)80037-5
Creative Commons License
This work is licensed under a Creative Commons Attribution-NonCommercial-No Derivative Works 4.0 International License.